APPLIED MATERIALS 0010-59787 Ceramic HeaterDescription The AMAT 0010 59787 PECVD reactor is a deposition chamber designed to deposit thin films or layers onto substrates used in various electronic devices and systems. The system employs a Chemical Vapor Deposition (CVD) process to deposit the desired film material onto the surface of the substrate. Specifications Reactor Type: PECVD (Plasma Enhanced Chemical Vapor Deposition) Substrate Loading: Automated single loading chamber Integrated
Shopping security
Each payment you make on thelockerguy is secured with strict SSL encryption and PCI DSS data protection protocols